Aluminum-Silicon Sputtering Target
Al/Si
7429-90-5/7440-21-3
7429-90-5/7440-21-3
| Product | Product Code |
Order or Specifications |
99% Aluminum-Silicon Sputtering Target |
AL-SI-02-ST |
 |
99.5% Aluminum-Silicon Sputtering Target |
AL-SI-025-ST |
|
99.9% Aluminum-Silicon Sputtering Target |
AL-SI-03-ST |
|
99.95% Aluminum-Silicon Sputtering Target |
AL-SI-035-ST |
|
99.99% Aluminum-Silicon Sputtering Target |
AL-SI-04-ST |
|
99.999% Aluminum-Silicon Sputtering Target |
AL-SI-05-ST
|
|
See research below. American Elements specializes in producing high purity Aluminum-Silicon sputtering targets with the highest possible density 
and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard target sizes range from 1" to 8" in diameter and from 2mm to 1/2" thick. "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Aluminum as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.
and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard target sizes range from 1" to 8" in diameter and from 2mm to 1/2" thick. "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Aluminum as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.
Aluminum is a Block P, Group 13, Period 3 element. The electronic configuration is [Ne] 3s2 3p1. In its elemental form aluminum's CAS number is 7429-90-5. The aluminum atom has a radius of 143.2.pm and it's Van der Waals radius is 200.pm.
Silicon is a Block P, Group 14, Period 3 element. The electronic configuration is [Ne] 3s2 3p2. In its elemental form silicon's CAS number is 7440-21-3. The silicon atom has a radius of 117.6.pm and it's Van der Waals radius is 210.pm.
| Formula | CAS No. | Appearance | Molecular Weight | Density | Melting Point | Boiling Point |
| Al/Si | 7429-90-5/7440-21-3 | Metal |
| PRODUCT CATALOG | Submicron & Nanopowder | Tolling | Ultra High Purity | Sputtering Target | Crystal Growth | Rod, Plate, Powder, etc. |
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