Boron Powder
B
7440-42-8
7440-42-8
| Product | Product Code |
Order or Specifications |
99% Boron Powder |
B-M-02-P |
 |
99.9% Boron Powder |
B-M-03-P |
|
99.99% Boron Powder |
B-M-04-P |
|
99.999% Boron Powder |
B-M-05-P
|
|
American Elements specializes in producing high purity Boron Powder with the smallest possible average grain sizes for use in preparation of pressed and bonded sputtering targets and in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Powders are also useful in any application where high surface areas are desired such as water treatment and in fuel cell and solar applications. Nanoparticles (See also Nanotechnology Information and Quantum Dots) also produce very high surface areas. Our standard Powder particle sizes average in the range of - 325 mesh, - 100 mesh, 10-50 microns and submicron (< 1 micron). We can also provide many materials in the nanoscale range. See research below. We also produce Boron as rod, ingot, pieces, pellets, disc, granules, wire, and in compound forms, such as oxide. Other shapes are available by request.
Boron is a Block P, Group 13, Period 2 element. The electronic configuration is [He] 2s2 2p1. In its elemental form boron's CAS number is 7440-42-8. The boron atom has a radius of 79.5.pm and it's Van der Waals radius is 200.pm.
| Formula | CAS No. | Appearance | Molecular Weight |
| B | 7440-42-8 | Black/Brown | 10.811 |
| PRODUCT CATALOG | Submicron & Nanopowder | Tolling | Ultra High Purity | Sputtering Target | Crystal Growth | Rod, Plate, Powder, etc. |
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