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Boron Oxide Tablets |
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B2O3 1303-86-2 |
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American Elements specializes in producing high purity unifrom shaped Boron Oxide Tablets with the highest possible density and smallest possible average grain sizes for use in Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD). Our standard Tablet sizes average in the range of 3 mm, 4 -5 mm, 10 - 50 mm, 1/8" and 1/4". We can also provide Tablets outside this range. We also produce Boron Oxide as pellets, pieces, powder, and sputtering target. Oxide compounds are not conductive to electricity. See research below. Other shapes are available by request.Boron is a Block P, Group 13, Period 2 element. The electronic configuration is [He] 2s2 2p1. In its elemental form boron's CAS number is 7440-42-8. The boron atom has a radius of 79.5.pm and it's Van der Waals radius is 200.pm. |
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© 2001-2007. American Elements is a U.S. Registered Trademark. All rights reserved. |
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Recent Research & Development for Boron Oxide
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