American Elements
Calcium Sputtering Target
Ca
7440-70-2
Product
Product Code
Order or Specifications
99% Calcium Sputtering Target
CA-M-02-ST
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99.5% Calcium Sputtering Target
CA-M-025-ST
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99.9% Calcium Sputtering Target
CA-M-03-ST
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99.95% Calcium Sputtering Target
CA-M-035-ST
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99.99% Calcium Sputtering Target
CA-M-04-ST
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99.999% Calcium Sputtering Target
CA-M-05-ST
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See research below. American Elements specializes in producing high purity Calcium sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Induction Plasma Spectrometry (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Calcium as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.

Calcium is a Block S, Group 2, Period 4 element. The electronic configuration is [Ar] 4s2. In its elemental form calcium's CAS number is 7440-70-2. The calcium atom has a radius of 197.4.pm and it's Van der Waals radius is 200.pm.

Formula CAS No. Appearance Molecular Weight
Ca 7440-70-2 Silvery 40.07
PRODUCT CATALOG Submicron & Nanopowder Tolling Ultra High Purity Sputtering Target Crystal Growth Rod, Plate, Powder, etc.
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Calcium Sputtering Target Recent Research

  • Hydrothermal crystallization of carbonate-containing hydroxyapatite coatings prepared by radiofrequency-magnetron sputtering method.
    J Biomed Mater Res B Appl Biomater. 2007 Jan;80(1):102-6.

  • Initial deposition of calcium phosphate ceramic on polyethylene and polydimethylsiloxane by rf magnetron sputtering deposition: the interface chemistry.
    Biomaterials. 2004 Feb;25(4):633-9.


  • Ion-beam-sputtering/mixing deposition of calcium phosphate coatings. I. Effects of ion-mixing beams.
    J Biomed Mater Res. 2001 Jun 15;55(4):587-95.

 

 

 

 

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