Copper-Chrome Sputtering Target
Cu/Cr
7440-50-8/7440-47-3
7440-50-8/7440-47-3
| Product | Product Code |
Order or Specifications |
99% Copper-Chrome Sputtering Target |
CU-CR-02-ST |
 |
99.5% Copper-Chrome Sputtering Target |
CU-CR-025-ST |
|
99.9% Copper-Chrome Sputtering Target |
CU-CR-03-ST |
|
99.95% Copper-Chrome Sputtering Target |
CU-CR-035-ST |
|
99.99% Copper-Chrome Sputtering Target |
CU-CR-04-ST |
|
99.999% Copper-Chrome Sputtering Target |
CU-CR-05-ST
|
|
See research below. American Elements specializes in producing high purity Copper-Chrome sputtering targets with the highest possible density 
and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard target sizes range from 1" to 8" in diameter and from 2mm to 1/2" thick. "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Copper as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.
and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard target sizes range from 1" to 8" in diameter and from 2mm to 1/2" thick. "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes such as nanoparticles (See also application discussion at Nanotechnology Information and at Quantum Dots) and in the form of solutions and organometallics. We also produce Copper as disc, granules, ingot, pellets, pieces, powder, and rod. Other shapes are available by request.
Copper is a Block D, Group 11, Period 4 element. The electronic configuration is [Ar] 3d10 4s1. In its elemental form copper's CAS number is 7440-50-8. The copper atom has a radius of 127.8 .pm and it's Van der Waals radius is 140.pm.
Chromium is a Block D, Group 6, Period 4 element. The electronic configuration is [Ar] 3d5 4s1. In its elemental form chromium's CAS number is 7440-47-3.
| Formula | CAS No. | Appearance | Molecular Weight |
| Cu/Cr | 7440-50-8/7440-47-3 | Metal |
| PRODUCT CATALOG | Submicron & Nanopowder | Tolling | Ultra High Purity | Sputtering Target | Crystal Growth | Rod, Plate, Powder, etc. |
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