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Nickel Sputtering Target |
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Ni 7440-02-0 |
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See research below. American Elements specializes in producing high purity Nickel sputtering targets with the highest possible density and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. Our standard Sputtering Targets for thin film are available monoblock or bonded with dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devises as well as the latest process equipment, such as large area coating for solar energy or fuel cells and flip-chip applications. Research sized targets are also produced as well as custom sizes and alloys. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Induction Plasma Spectrometry (ICP). "Sputtering" allows for thin film deposition of an ultra high purity sputtering metallic or oxide material onto another solid substrate by the controlled removal and conversion of the target material into a directed gaseous/plasma phase through ionic bombardment. We can also provide targets outside this range in addition to just about any size rectangular, annular, or oval target. Materials are produced using crystallization, solid state and other ultra high purification processes such as sublimation. American Elements specializes in producing custom compositions for commercial and research applications and for new proprietary technologies. American Elements also casts any of the rare earth metals and most other advanced materials into rod, bar or plate form, as well as other machined shapes and through other processes nanoparticles. We also produce Nickel as rods, powder and plates. Other shapes are available by request.Nickel is a Block D, Group 4, Period 4 element. The electronic configuration is [Ar]3d84s2. In its elemental form nickel's CAS number is 7440-02-0. The nickel atom has a radius of 149.pm and it's Van der Waals radius is 163.pm. It is extensively alloyed with iron, chromium, molybdenum, tungsten and other metals produce stainless and other anti-corrosive steel and other corrosion-resistant alloys. It is highly electronically conductive and has many applications as a result. It is the basis of the nickel hydride battery. Most recently, its conductive properties have made it an ideal component for ceramic anode formulations used in oxygen generation and solid oxide fuel cell applications. Catalytic nickel is used to hydrogenate vegetable oils. Nickel additions to glass and ceramic glazes impart a bright green. It is also used in pigments for this purpose. |
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Recent Research & Development for Nickel Metal
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